Preparation process of niobium flat target material?

The preparation process of niobium planar target material is a multi-step precision process aimed at obtaining high-purity, uniformly structured, and stable performance target materials.

1、 Main preparation steps

1. Raw material processing and mixing

Using high-purity niobium ingots as raw materials, the original cast structure is broken by forging, followed by acid washing and vacuum annealing to eliminate surface defects and internal stress. For alloy target materials, molybdenum powder and niobium powder need to be mixed and sieved multiple times to ensure uniform composition.

2. Forming and sintering

Powder metallurgy method: suitable for industrial mass production, the niobium oxide powder is formed by cold isostatic pressing, and then vacuum sintered at 1400 ° C for 2 hours to form a dense target material.

HIP technology: Through high-temperature and high-pressure treatment, the target material is made to have a density of ≥ 98% of the theoretical density, with no internal pores, especially suitable for complex structures such as step targets.

3. Plastic processing and heat treatment

Through multiple forging and rolling processes, the grain size is further refined and the microstructure is homogenized. After each processing, acid washing and vacuum annealing are required to obtain an equiaxed crystal structure with a grain size of<50 μ m.

4. Precision machining

Use a CNC machining center to cut and grind the target material, ensuring a flatness of ≤ 0.1mm/m and a step accuracy of ± 0.05mm to meet high-precision coating requirements.

2、 Technological innovation points

Grain control: Through multi-stage forging and intermediate heat treatment, grain size uniformity is achieved to improve the uniformity of sputtered films.

Defect elimination: HIP technology significantly reduces internal pores, enhances the mechanical properties and sputtering stability of the target material.

Composition uniformity: The alloy target material adopts a stepwise mixing process to avoid component segregation.

3、 Application and Performance Requirements

Niobium planar target materials need to meet high density, low oxygen content, and excellent three-axis consistency, and are suitable for semiconductor, optical coating, and other fields. The optimization of its preparation process is directly related to the quality and efficiency of thin film deposition.